MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Product
Process And Chamber Monitoring Software & Systems
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MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
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Product
Process Sense™ NDIR End Point Detector For Chamber Clean
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The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Product
DELTA™ IV 4-zone Flow Ratio Controller
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DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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Product
High Accuracy In-Situ Mass Flow Verifier
HA-MFV
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The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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Product
Vacuum Process And Chamber Environment Monitors
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Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Product
High Power Microwave Plasma System
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The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Product
Multi-Channel Ozone Delivery System With In-rack Chiller
SEMOZON® AX8575
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The SEMOZON® AX8575 is a fully integrated, high output ozone gas delivery system that can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. It has an optional in-rack chiller for ultra-high concentrations.
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Product
High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Product
Vacuum Quality Monitor Systems
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The 835 VQM is a mass spectrometer that operates from UHV to 10-5 Torr and accurately measures the gases in the vacuum chamber. The 835 VQM Differential Pump System delivers the advantages of the 835 VQM at higher pressures. The VQM system consists of an autoresonant ion trap mass spectrometer gauge, a VQM Controller and VQM Viewer software that that converts raw data into actionable information. The system is ratiometric, meaning that it determines the ratio of each gas to other gases in a vacuum chamber. It is usually coupled with a total pressure gauge to provide partial pressures of each gas as indication of the quality of the vacuum in the chamber.
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Product
DELTA™ III 3-zone Flow Ratio Controller
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The DELTA™ III Flow Ratio Controller divides and controls mixed process gas flows to three chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology.
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Product
KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
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The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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Product
PRIME Ultra Clean, Ultra High Concentration, Ultra High Flow Ozone Generator
SEMOZON® AX8410
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The SEMOZON® AX8410 PRIME is the initial product offering in MKS' next generation platform of compact, high concentration, high flow, ultra clean ozone generators. It features a newly designed cell and power structure to achieve twice the ozone output of earlier models with a similar footprint.
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Product
Compact Networked I/O
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We offer networked I/O devices based on Ethernet, DeviceNet™, and Profibus for industrial control and automation applications.
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Product
Industrial Pressure Transducers
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These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.


















