Inductively Coupled Plasma
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
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The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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Inductive Sensors
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In general, inductive proximity switches consist of four basic elements: a coil, an oscillator, a threshold switch and an output stage with short-circuit protection.The oscillator generates a high frequency, electromagnetic alternating field which is emitted from the active face of the coil.Eddy currents are induced in a metal object that enters this field. These eddy currents draw energy from both the electromagnetic field and from the oscillator which is consequently attenuated.The more energy taken the closer the metal object moves towards the active face. The threshold switch switches on the output stage at a defined attenuation value.In proximity switches with a DC voltage supply, this switch is designed as an NPN transistor which switches the connected load to the negative pole or as a PNP transistor which switches the load to the positive pole. The output stage is a thyristor or a triac in AC voltage switches.
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Inductive Sensors
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Inductive sensor designed to detect shaft speed, shaft position, gate position, or object presenceTotally sealed constructionMulti-voltage 24 - 240 VAC/VDCDetects ferrous targets up to 5/16" (8 mm)IP 65 Protection
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RF Plasma Generators
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Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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Inductive Sensor
HFCT Ø 30-39-50mm
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Techimp HFCT is an inductive sensor for partial discharge measurements. It is suitable for on/off line PD tests on many electrical systems (cables, transformers, rotating machine, etc..). It has to be applied to the ground connection of the system to be tested.
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Inductive Sensor
Ampstik®
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The Ampstik is easy to use and provides accurate information to anyone working with medium and high voltage. It gives line personnel the right answers so they have the ability to make decisions in the field.
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Coupling Decoupling Network
TBCDN-M1
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The TBCDN-M1 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Inductive Load Banks
L-Series
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L-series inductive load banks are devices which contain inductive loads, apply the load to an electrical power source and dissipate the reactive power of the electrical source. L-series load banks are designed for portable and fixed applications. Hilkar brand L-series load banks have robust design and are specifically designed for corrosive environments. Load banks can be controlled via local, remote, wireless remote or automatic control systems.
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Induction Heater
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Prominent & Leading Manufacturer from Vadodara, we offer High Frequency Induction Heater, Induction Heating Machine and Induction Bearing Heater.
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CDNs - Coupling Decoupling Network
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Coupling Decoupling Networks, commonly called CDNs for IEC-61000-4-6 conducted immunity testing, serve the purpose of Injecting common mode disturbances These CDNs also ensures these signals do not interfere (decoupling) with auxiliary equipment connected to the device under test (DUT)
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Plasma Emission Detectors for Gas Chromatographs
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Our patented Plasma Emission Detector is available for integration into any gas chromatography system or installation. It has been designed for ‘plug and play’ installation and to allow for analysis of impurities from PPB to % levels using either capillary or packed columns.
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Rectangular-shaped Inductive Proximity Sensor
GX-F/H
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Panasonic Industrial Devices Sales Company of America
The GX-F/H Rectangular-Shaped Inductive Proximity Sensor has a very long and stable sensing range among comparable rectangular inductive Proximity Sensors and is easy to install. Precise adjustment and control of sensing sensitivity greatly reduces individual Sensor differences and variations.
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Programmable Inductance Decade Box
PLS Series
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The PLS Series is a broad line of high precision programmable decade inductors. They provide straight inductance in a wide selection of ranges, tolerances andratings. IET Labs also supplies custom combination substituters for capacitance and resistance as well as sources for voltage and current.
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Unclamped Inductive Load Tester
ITC55100C
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The system has been designed around a very powerful micro-controller that gives it a timing resolution of 40ns, twenty times faster than the previous model. Its response time to the peak and zero current is improved ten times. Combined this gives greater accuracy for the charging and avalanche times and for the reported peak drain current.
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Coupled Cavity TWTs
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Communications & Power Industries
• Frequencies from 2.7 to 37.5 GHz• Peak levels: 500 W to 180 kW• Cooling type: air, liquid, conduction• Depressed or grounded collectors• CW (Continuous Wave) and Pulsed
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Plasma Profiling TOFMS
PP-TOFMS
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Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Coupling Decoupling Network
TBCDN-M3
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The TBCDN-M3 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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UV Plasma Sources
UVS300|UVS 10/35
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The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
