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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Ultraviolet Checker
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For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Product
Extreme Environment Sensors
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For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Product
Light Source
FiberPal OT-3000
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The OT-3220/3221 is designed for a high performance stabilized laser source, especially in practice for FTTX networking installation and maintenance fieldworks environment requirements. It is usually applied as stable laser sources for wide range of optical testers and tools in optical fiber cabling and transmission systems.
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Product
PCE-2000UV Ultraviolet LED/Module Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV Ultraviolet LED/Module Radiation Measurement System can realize the measurement of the relative spectral power distribution of ultraviolet LED, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and total radiation flux in specific wavelength.
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Product
Light Microscopes
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Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Product
Light Meters
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Light Meters are used to measure the light output of an illumination source for a number of optical applications. Light Meters are measurement devices that feature photodiodes to determine the level of light transmitted from a source. Light Meters possess simple, easy to read screens upon which measurements are displayed in one or more photometric units. Most Light Meters possess traceable NIST certification for proof of accuracy.
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Product
Light Microscopy
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Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Product
OUTDOOR LIGHTING
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At CLS LED, we specialize in transforming outdoor spaces with cutting-edge LED lighting solutions. Our outdoor lighting systems combine aesthetic excellence with technical precision, creating captivating nighttime environments while ensuring safety, security, and energy efficiency. Whether you’re illuminating a historic building facade, designing an inviting park atmosphere, or creating dramatic landscape features, our expertise and premium LED technology deliver outstanding results that stand the test of time and weather.
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Product
Light Meters
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Our light meters are designed for simple and accurate results in an industrial setting. Whether you are checking work spaces, parking lots, or baseball fields for safe levels of lighting or measuring for testing design compliance, a light meter from Sper Scientific will get the job done. Obtain precise UV, FC or Lux measurements, in multiple light measurement ranges. These light meters are designed for use in work spaces, labs, schools, outdoor studies, optics, home inspections, and many others. In addition, you may use these meters to check compliance with ANSI/NFPA 101 (standards for emergency & exit lighting).
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Product
Light Monitor
LM-101
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The LM-101 Light Monitor system provides an efficient and cost effective solution for monitoring coating thickness in real time. It consists of the LM-101 Light Monitor, LM-101A/AS light source, and Detector assembly.
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Product
Structured Light
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Structured light systems from ams enable 3D imaging applications to achieve extremely high accuracy. Accurate structured light technology is behind the user face recognition being implemented in smartphones. Structured light products and design expertise from ams help customers get to market quickly and scale up production rapidly.
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Product
Light Source
UVF-210S
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By traversing two light guide ends (right and left) by means of the high accuracy air cylinder, alternating irradiation of two independent positions is possible.
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Product
"Extremely Random" Precision Noise Generator
Model 3025
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The Model 3025, "Extremely Random"TM Precision Noise Generator supplies White and Pink Noise, and a 1 kHz reference signal. Crystal controlled - the pseudo random circuitry provides a 6.5 Day pseudo-random cycle time, assuring a "Extremely Random"TM noise source.
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Product
Ambient Light Sensors
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Bristol Industrial & Research Associates Ltd
Ambient light sensors measure background or ambient light levels. Biral sensors are typically used in aviation Runway Visual Range (RVR) systems and have a well defined field of view.
