Focused Ion Beam
A scanning electron microscope with the electron source replaced by a gallium ion gun. Used for fault analysis and modification of modern microchips and semiconductor devices. (http://www.empa.ch)
See Also: Beam
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
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Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Product
Microscopy Software/Hardware
ZEISS Atlas 5
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Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
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ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Etch System
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When it comes to clean etches, Veeco’s Ion Beam Etch (IBE) systems deliver with sharp control and minimal disruption. Using a focused argon ion beam, this subtractive technique etches nanoscale features with precision, making it a go-to for pattern transfer, layer removal, and surface refinement where edge definition matters most.
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Sputtering Systems
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Known for precision and cleanliness, Veeco Ion Beam Sputtering (IBS) systems are ideal when engineers need tight control over film thickness, composition, and optical performance. Using a focused ion beam, IBS dislodges atoms from a target, depositing them onto a surface in smooth, ultra-uniform layers.
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50% Beam Splitter BK7, Fixed Horizontal-Bend Mount
E1834G
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The E1834G is a 50% beam splitter in a high performance horizontal mount that offer the high pointing stability for Keysight laser interferometer measurement system. The 8 flexure feet are designed for stable beam pointing.
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Product
33% Beam Splitter
10700A
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The Keysight 10700A beam splitter is designed for beam diameters of 6 mm or less. It reflects one third of the total incoming laser beam, and transmits two thirds. It includes a housing for standard mounting.
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Beam Bender
10707A
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The Keysight 10707A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 6 mm or less . Includes a housing for standard mounting.
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50% Beam Splitter
10701A
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The Keysight 10701A beam splitter is designed for beam diameters of 6 mm or less. It reflects one half of the total incoming laser beam, and transmits one half. The Keysight 10701A optic includes a housing for standard mounting.
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Beam Bender
10726A
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The Keysight 10726A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This bare optic requires a user-supplied mount.
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15% Beam Splitter
10725C
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The 10725C 15% beam splitter, designed for beam diameters of 9 mm or less, reflects 15% of the total incoming laser beam and transmits 85% straight through. This optic is without housing and requires a user-supplied mount.
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Product
Beam Bender BK7, Fixed Horizontal-Bend Mount
E1834M
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The E1834M is a beam bender that bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This referenced optics uses high performance horizontal mount to deliver laser beam throughout a measurement system. The 8 flexure feet are designed for stable beam pointing.
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33% Beam Splitter - BK7, fixed horizontal-bend mount
E1834E
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The E1834E is a 33% beam splitter in a high performance horizontal mount that offer the high pointing stability for Keysight laser interferometer measurement system. The 8 flexure feet are designed for stable beam pointing.
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Product
67% Beam Splitter BK7, Fixed Horizontal-Bend Mount
E1834J
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The E1834J is a 67% beam splitter in a high performance horizontal mount that offer the high pointing stability for Keysight laser interferometer measurement system. The 8 flexure feet are designed for stable beam pointing.
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Product
50% Beam Splitter
10725A
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The 10725A 50% beam splitter, designed for beam diameters of 9 mm or less, divides the beam into equal parts. It transmits one part straight through, and bends the other part at a 90-degree angle. This optic is without housing and requires a user-supplied mount.
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Product
Beam Bender BK7, Fixed Vertical-Bend Mount
E1834Z
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The E1834Z is a beam bender that bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This referenced optics uses high performance vertical mount to deliver laser beam throughout a measurement system. The 8 flexure feet are designed for stable beam pointing.
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Ion Beam System
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Veeco's unmatched Ion Beam know-how delivers proven etch and deposition performance enabling the data storage and MEMS markets for decades.
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Ion Chromatography
930 Compact IC Flex
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The 930 Compact IC Flex is a versatile ion chromatograph developed with a focus on the requirements of routine users.
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Ion Chromatography
Eco IC
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Discover Eco IC, an ion chromatography system that focuses on the essentials while not compromising on quality, robustness, and reliability. Eco IC has been developed to enable more users to benefit from this technique. Whether you need to perform routine water analysis or you’re looking for an instrument for higher education, Eco IC comes with all the components you need. In addition, you can also save time and reduce work by getting an automated system.
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Ion Beam Milling Systems
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When material specimen surfaces are prepared for SEM or incident light microscopy, the specimen usually undergoes multiple processes until the layer or surface to be analyzed is machined with precision. Leica Microsystems’ workflow solutions for solid state technology cover all steps required for demanding high-quality sample preparation.
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Ion Blower Guns
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For manual cleaning tasks, we combine the advantages of Eltex nozzle technology with the variability of a hand-held air gun. Thus, a wide variety of shapes can be cleaned efficiently. For use in hazardous areas, we offer a special version of the ion blower guns.
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Ion Chromatography
940 Professional IC Vario
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High-end ion chromatography system for research applications and method development
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Ion Blower Nozzles
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VARIO discharge products consist of a separate AC power supply unit for connecting one or more Eltex discharging components. In SINGLE discharging, the voltage generation (power supply unit) is integrated in the bar.
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Capacitors - Beam Lead
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Macom Technology Solutions Holdings Inc.
MACOM’s MMI-9000 and 9100 Series Chip Capacitors feature high stand-off voltage and low dielectric loss leveraging nitride/oxide dielectric layers. Gold bonding surfaces, top and bottom provide ease of bonding and minimum contact resistance. MACOMs beam lead capacitors have high insulation resistance, low dissipation factor, and low temperature coefficient, which are features that produce devices with excellent long-term stability.
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Ion Chromatography
IC Software- MagIC Net
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MagIC Net is the software to control your Metrohm ion chromatograph and any modules for liquid handling, sample preparation, and automation connected. Intuitive operation, comprehensive system monitoring, and straightforward data management make MagIC Net, what it is: the preferred software for state-of-the art ion chromatography.
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Reactive Ion Etch (RIE)
Versys Metal Product Family
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Metal etch processes play a key role in connecting the individual components that form an integrated circuit (IC), such as forming wires and electrical connections. These processes are also used to pattern complicated metal hardmasks (MHM) that are used to form the wiring for advanced devices.
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Gridless End-Hall Ion Sources
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Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
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*Beam Propagation Analysis
M²
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M², or Beam Propagation Ratio, is a value that indicates how close a laser is to being a single mode TEM00 beam, which in turn determines how small a beam waist can be focused. For the perfect Gaussian TEM00 condition the M² equals 1. M² cannot be determined from a single beam profile measurement. The ISO/DIS 11146 requires that M² be calculated from a series of measurements. M² is measured on real beams by focusing the beam with a fixed position lens of known focal length, and then measuring the characteristics of the artificially created beam waist and divergence. We have a number of solutions for the measurement of M² ranging from simple manual processes to fully automated dedicated instruments, depending on the frequency of the need to measure M² of lasers and laser systems.
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Product
UV-NIR Beam Profiler
CinCam
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CINOGY Technologies CinCam is optimized to provide excellent sensitivity from the UV to NIR spectral range involving CCD/CMOS/InGaAs technologies. Thanks to its high resolution and its small pixel size, the CinCam ensures the highest accuracy in laser beam analysis of cw and pulsed laser systems. The plug and play design facilitates easy and flexible adaption to standard optical components.
